| Issue |
| Total 47 articles [ 키워드: CVD ] |
| No. | Article |
| 41 |
Korean Journal of Chemical Engineering, 13 (5), pp.473-477 (1996) PREPARATION AND CHARACTERIZATION OF TiO2 THIN FILMS BY PECVD ON Si SUBSTRATE Lee IS, Kim JW, Youn CJ, et al. |
| 42 |
Korean Journal of Chemical Engineering, 13 (5), pp.510-514 (1996) REMOTE PLASMA ENHANCED METAL ORGANIC CHEMI- CAL VAPOR DEPOSITION OF TiN FOR DIFFUSION BARRIER Yun JY, Rhee SW |
| 43 |
Korean Journal of Chemical Engineering, 13 (5), pp.522-529 (1996) GROWTH MECHANISM OF 3C-SiC(111) ON Si WITHOUT CARBONIZATION PROCESS Seo YH, Nahm KS, Suh EK, et al. |
| 44 |
Korean Journal of Chemical Engineering, 13 (5), pp.530-537 (1996) PREPARATION OF SUPPORTED PALLADIUM MEMBRANE AND SEPARATION OF HYDROGEN Aoki K, Yokoyama S, Kusakabe K, et al. |
| 45 |
Korean Journal of Chemical Engineering, 13 (4), pp.356-363 (1996) AROMATIZATION OF PROPANE OVER Zn/HZSM-5 CATALYSTS PREPARED BY CHEMICAL VAPOR DEPOSITION Kwak BS, Sachtler WMH |
| 46 |
Korean Journal of Chemical Engineering, 12 (5), pp.593-596 (1995) THE CRYSTALLINE QUALITY OF Si FILMS PREPARED BY THERMAL-AND PHOTO-CVD AT LOW TEMPERATURES Chung CH, Han JH, Rhee SW, et al. |
| 47 |
Korean Journal of Chemical Engineering, 12 (1), pp.1-11 (1995) CHEMICAL VAPOR DEPOSITION OF ALUMINUM FOR ULSI APPLICATIONS Rhee SW |
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