Issue
Total 47 articles [ 키워드: CVD ]
No. Article
11 Korean Journal of Chemical Engineering, 27 (1), pp.315-319 (2010)
Formation of PbTiO3 films from multilayered structures of primitive oxides
Kang BS, Lee WG
12 Korean Journal of Chemical Engineering, 25 (6), pp.1539-1545 (2008)
Effects of silyl concentration, hydrogen concentration, ion flux, and silyl surface diffusion length on microcrystalline silicon film growth
Wen S, Zhang L, Lu J, et al.
13 Korean Journal of Chemical Engineering, 25 (3), pp.443-445 (2008)
Electrochemical deposition of Pt nanoparticles on CNTs for fuel cell electrode
Kim H, Jeong NJ, Lee SJ, et al.
14 Korean Journal of Chemical Engineering, 23 (2), pp.325-328 (2006)
Formation of nanodots and nanostripes of carbon nitride on silicon by plasmaand thermal treatments
Kim SH, Hong JH, Hahn YB
15 Korean Journal of Chemical Engineering, 22 (5), pp.770-773 (2005)
Comparative Study of Diamond Films Grown on Silicon Substrate Using Microwave Plasma Chemical Vapor Deposition and Hot-Filament Chemical Vapor Deposition Technique
Dar MA, Kim YS, Ansari SG, et al.
16 Korean Journal of Chemical Engineering, 22 (4), pp.639-642 (2005)
Structural Properties of Amorphous Carbon Thin Films Deposited by LF (100 kHz), RF (13.56MHz), and Pulsed RF (13.56MHz) Plasma CVD
Kim DS
17 Korean Journal of Chemical Engineering, 21 (6), pp.1240-1244 (2004)
Electrical Characterization of C-coated Nickel Silicide Nanowires Grown on Ni-loaded Si Substrate
Lee KS, Lee SH, Mo YH, et al.
18 Korean Journal of Chemical Engineering, 21 (6), pp.1256-1259 (2004)
Fourier Transform Infrared Spectroscopy Studies on Thermal Decomposition of Tetrakis-dimethyl-amido Zirconium for Chemical Vapor Deposition of ZrN
Kim IW, Kim SJ, Kim DH, et al.
19 Korean Journal of Chemical Engineering, 21 (1), pp.257-261 (2004)
Growth of GaN Nanowires on Si Substrate Using Ni Catalyst in Vertical Chemical Vapor Deposition Reactor
Kim TY, Lee SH, Mo YH, et al.
20 Korean Journal of Chemical Engineering, 21 (1), pp.262-266 (2004)
Nucleation of Diamond over Nanotube Coated Si Substrate Using Hot Filament Chemical Vapor Deposition (CVD) System
Ansari SG, Seo HK, Kim GS, et al.
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