Issue
Total 47 articles [ 키워드: CVD ]
No. Article
21 Korean Journal of Chemical Engineering, 21 (1), pp.286-291 (2004)
Thermodynamic Analysis of Liquid Source Chemical Vapor Deposition Process for the Preparation of a Ba-Sr-Ti Oxide Film
Cho YS, Cho SI, Heo JS, et al.
22 Korean Journal of Chemical Engineering, 20 (6), pp.1154-1157 (2003)
Lonsdaleite Diamond Growth on Reconstructed Si (100) by Hot-Filament Chemical Vapor Deposition (HFCVD)
Chiem CV, Seo HK, Ansari SG, et al.
23 Korean Journal of Chemical Engineering, 20 (4), pp.653-658 (2003)
Catalytic Effect of Metal Elements on the Growth of GaN and Mg-doped GaN Micro-Crystals
Nahm KS, Kim TY, Lee SH
24 Korean Journal of Chemical Engineering, 20 (4), pp.772-775 (2003)
Effect of Deposition Temperature on the Growth of Y1Ba2Cu3O7-x Thin Film by Aerosol Assisted Chemical Vapor Deposition Using Liquid Solution Sources
Kim BR, Ansari SG, Kim YS, et al.
25 Korean Journal of Chemical Engineering, 20 (3), pp.566-571 (2003)
Low Cost Growth Route for Single-walled Carbon Nanotubes from Decomposition of Acetylene over Magnesia Supported Fe-Mo Catalyst
Shajahan M, Mo YH, Nahm KS
26 Korean Journal of Chemical Engineering, 18 (3), pp.322-329 (2001)
Gas Permeation Characteristics of Silica/Alumina Composite Membrane Prepared by Chemical Vapor Deposition
Kim SS, Sea BK
27 Korean Journal of Chemical Engineering, 18 (3), pp.371-375 (2001)
Discharge Capacitance of Electric Double Layer Capacitor with Electrodes Made of Carbon Nanotubes Directly Deposited on SUS304 Plates
Lee SW, Park DK, Lee JK, et al.
28 Korean Journal of Chemical Engineering, 18 (2), pp.208-214 (2001)
Effects of Bimetallic Catalyst Composition and Growth Parameters on the Growth Density and Diameter of Carbon Nanotubes
Fazle Kibria AKM, Mo YH, Yun MH, et al.
29 Korean Journal of Chemical Engineering, 17 (5), pp.524-527 (2000)
Preparation of Superconducting Y-Ba-Cu-O Films by Aerosol Assisted Chemical Vapor Deposition Using Liquid Solution Sources
Kim BR, Hwang SC, Lee HG, et al.
30 Korean Journal of Chemical Engineering, 17 (4), pp.449-454 (2000)
Characteristics of Aluminum Films Prepared by Metalorganic Chemical Vapor Deposition Using Diemthylethylamine Alane on the Plasma-Pretreated TiN Surfaces
Kim DH, Kim BY
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