| Issue |
| Total 47 articles [ 키워드: CVD ] |
| No. | Article |
| 31 |
Korean Journal of Chemical Engineering, 17 (4), pp.473-476 (2000) Preparation of Y1-xYbxBa2Cu3O7-y Superconducting Films by Chemical Vapor Deposition Kim YS, Park HH, Kim YS, et al. |
| 32 |
Korean Journal of Chemical Engineering, 16 (6), pp.774-777 (1999) Degradation of Ba(DPM)(2) During Storage in a Desiccator for Extended Periods Ryu HK, Heo JS, Cho SI, et al. |
| 33 |
Korean Journal of Chemical Engineering, 16 (2), pp.229-233 (1999) The Growth of LiNbO3 Thin Film by LPMOCVD Using β-Diketonate Complexes Jung SC, Imaishi N |
| 34 |
Korean Journal of Chemical Engineering, 16 (1), pp.12-21 (1999) NUMERICAL AMALYSIS OF LPCVD OF SiO2 FILMS FROM DIETHYLSILANE/OXYGEN Kim EJ, Kim CJ, Chung KY |
| 35 |
Korean Journal of Chemical Engineering, 15 (6), pp.652-657 (1998) A Study of Deposition Rate and characterization of BN Thin Films Prepared by CVD Jin YG, Lee SY, Nam YW, et al. |
| 36 |
Korean Journal of Chemical Engineering, 15 (3), pp.243-245 (1998) Crystalline Structure of YSZ Thin Films Deposited on Si((111) Substrate by Chemical Vapor Deposition Hwang SC, Lee HG, Shin HS |
| 37 |
Korean Journal of Chemical Engineering, 15 (2), pp.217-222 (1998) EFFECT OF RAPID THERMAL ANNEALING ON THE STRUCTURAL AND ELECTRICAL PROPERTIES OF TiO2 THIN FILMS PREPARED BY PLASMA ENHANCED CVD Kim JW, Kim DO, Hahn YB |
| 38 |
Korean Journal of Chemical Engineering, 15 (1), pp.56-63 (1998) MODELING OF SiO2 CVD FROM TEOS/OZONE IN A SEPARATE - GAS -INJECTION REACTOR Kim EJ, Gill WN |
| 39 |
Korean Journal of Chemical Engineering, 14 (2), pp.129-135 (1997) EVALUATION OF NUCLEATION ACTIVATION ENERGY IN METAL CVD PROCESSES Han J, Jensen KF |
| 40 |
Korean Journal of Chemical Engineering, 14 (2), pp.136-140 (1997) METALORGANIC CHEMICAL VAPOR DEPOSITION OF FERROELECTRIC Pb(ZrXTi1-X)O3 THIN FILMS Chung CW, Kim D |
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