It is well known that the design of the heating source imposes an inherent limitation on the performance of the rapid thermal processor (RTP). In this work, the similarities and differences between flat and angled reflectors are studied. The discontinuous characteristic of the angled reflector can be used to compensate for the edge that loss of the thin wafer and, consequently, a better temperature uniformity can be achieved. A design procedure is proposed to place the lamp ring as well as the angle of the reflectors. For the control system design, the measurement selection criterion of Huang et al. is employed to find candidate measurement sets followed by a structured singular value criterion. Once the control structure is determined, multivariable temperature controllers were designed according to the internal model control (IMC) principle. From porcess insight, a farily simple nonlinear compensation is also devised. Simulation results show that while only half of the thermal budget is used improved temperature uniformity can be obtained by using proposed approach.