| Issue |
Korean Journal of Chemical Engineering,
Vol.35, No.1, 246-250, 2018
Vol.35, No.1, 246-250, 2018
Effects of growth temperature on titanium carbide (TiC) film formation using low-frequency (60 Hz) plasma-enhanced chemical vapor deposition
TiC films were formed by low-frequency (60Hz) plasma-enhanced chemical vapor deposition (LFPECVD) using TiCl4, CH4, and H2 gas mixtures. The effects of the growth temperature and feasibility for the on-glass deposition of TiC films were investigated. The growth kinematics of TiC films was controlled mainly by surface-reactions below 450 °C, and dominated by a mass-transfer process above 450 °C. The films exhibited a face-centered cubic structure, and the preferred orientation of film growth was mainly the (200) plane. The [C]/[Ti] ratio was over-stoichiometric below 400 °C, and became almost stoichiometric above 450 °C. The optical properties of the films were characterized by high reflectance in near infrared (NIR) region and a steep edge in the visible region, and the reflectance in the NIR region increased gradually with increasing temperature. As a result, LF-PECVD is a useful technique to acquire Cl-free TiC films at relatively low temperatures.
[References]
- Mani A, Aubert P, Mercier F, Khodja H, Berthierd C, Houdy P, Surf. Coat. Technol., 194, 190, 2005
- Gao XH, Guo ZM, Geng QF, Ma PJ, Liu G, Sol. Energy Mater. Sol. Cells, 157, 543, 2016
- Zhao C, Wang Q, Zhang H, Passerini S, Qian X, ACS Appl. Mater. Interfaces, 8, 15661, 2016
- Pierson HO, Handbook of Chemical Vapor Deposition, Noyes Publications, Park Ridge, NJ (1999).
- Rohrer J, Hyldgaard P, Phys. Rev. B, 82, 045415, 2010
- Lieberman MA, Lichtenberg AJ, Principle of Plasma Discharges and Materials Processing, Wiley, NY (1994).
- Fridman A, Plasma Chemistry, Cambridge University Press, New York, NY (2008).
- Kim HT, Kim CD, Pyo MS, Park C, Korean J. Chem. Eng., 31(10), 1892, 2014
- Kim HT, Park DK, Choi WS, J. Korean Phys. Soc., 42, S916, 2003
- Kim HT, Kim MJ, Sohn SH, J. Phys. Chem. Solids, 73, 931, 2012
- Kim HT, Sohn SH, Vacuum, 86, 2148, 2012
- Shinde NM, Deokate RJ, Lokhande CD, J. Anal. Appl. Pyrolysis, 100, 12, 2013
- Chen L, Park C, Korean J. Chem. Eng., 34(4), 1187, 2017
- Qian M, Froes FH, Titanium Powder Metallurgy: Science, Technology and Applications, Butterworth-Heinemann, Waltham, MA (2015).
- Kim HT, Mun T, Park C, Jin SW, Park HY, J. Power Sources, 244, 641, 2013
- Huston PL, Chemical Kinetics and Reaction Dynamics, McGraw-Hill, New York, NY (2001).
- Fair RB, Rapid Thermal Processing, Academic Press, Boston, MA (1993).
- Adachi S, The Handbook on Optical Constants of Metals: In Tables and Figures, World Scientific, Singapore (2013).
참고문헌정보(참고문헌, 인용문헌)는 화학공학소재연구정보센터에 의해 제공되고 있습니다.