| Issue |
Korean Journal of Chemical Engineering,
Vol.31, No.10, 1892-1897, 2014
Vol.31, No.10, 1892-1897, 2014
Electrical and optical characteristics of Ar plasma generated by low-frequency (60Hz) power source
The optical and electrical properties of Ar plasma, ignited using low-frequency (LF, 60 Hz) power source, were investigated. The plasma resistance, electron temperature, and density were found to be ~10^(2) Ω, ~3 eV and ~10^(8) cm-3, respectively. The plasma parameters are strongly dependent on Ar pressure and discharge current, and the results of optical emission analysis showed similar tendency to the probe measurements. The properties of Ar plasma are similar
to DC-pulsed discharge, and the polarity of AC power can be possible of depositions and modifications on both conductive and insulating materials, unlike DC discharge. The a-C films, which are deposited using Ar-diluted CH4 plasma, showed a smooth surface, high transmittance (>80%), high sp3 concentration (~40%) and wide optical band-gap (3.55 eV). Consequently, the LF power source was found to be a very simple, convenient and inexpensive tool to generate
plasmas for various applications.
[References]
- Schuegraf KK, Handbook of thin film deposition processes and techniques: Principles, methods, equipment, and applications, Noyes Publication, New Jersey, 1988
- Lieberman MA, Lichtenberg AJ, Principles of plasma discharges and materials processing, Wiley, New York, 1994
- Fridman A, Plasma chemistry, Cambridge University Press, New York, 2008
- Adamson AW, Gast AP, Physical chemistry of surfaces, Wiley, New York, 1997
- Kim HT, Sohn SH, Vacuum, 86, 2146, 2012
- Kim HT, Kim MJ, Sohn SH, J. Phys. Chem. Solids, 73, 931, 2012
- Shimozuma M, Kitamore K, Ohno H, Hasegawa H, Tagashira H, J. Electron. Mater., 14, 573, 1985
- Kim HT, Park DK, Choi WS, J. Korean Phys. Soc., 42, 916, 2003
- Chapman B, Glow discharge processes: Sputtering and plasma etching, Wiley, New York, 1981
- Ruzic DN, Electrical probes for low temperature plasmas, AVS Press, New York, 1994
- National Institute of Standards and Technology (NIST) Atomic spectra database data, http://www.nist.gov/atomic-spectroscopy.cfm.
- Griem HR, Principle of plasma spectroscopy, Cambridge University Press, Cambridge, UK, 1997
- Robertson J, Mater. Sci. Eng., 37, 129, 2002
- Robertson J, Surf. Coat. Technol., 50, 185, 1992
- Geis MW, Tamor MA, Encyclopedia of applied physics, VCH Publishers, New York, 1993
- Mort J, Jansen F, Plasma deposited thin films, CRC Press, Boca Raton, 1986
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