Issue
Total 4 articles [ 키워드: Amorphous Carbon ]
No. Article
1 Korean Journal of Chemical Engineering, 40 (6), pp.1268-1276 (2023)
Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes
Jie Li, Heeyeop Chae
2 Korean Journal of Chemical Engineering, 31 (10), pp.1892-1897 (2014)
Electrical and optical characteristics of Ar plasma generated by low-frequency (60Hz) power source
Kim HT, Kim CD, Pyo MS, et al.
3 Korean Journal of Chemical Engineering, 23 (2), pp.325-328 (2006)
Formation of nanodots and nanostripes of carbon nitride on silicon by plasmaand thermal treatments
Kim SH, Hong JH, Hahn YB
4 Korean Journal of Chemical Engineering, 22 (4), pp.639-642 (2005)
Structural Properties of Amorphous Carbon Thin Films Deposited by LF (100 kHz), RF (13.56MHz), and Pulsed RF (13.56MHz) Plasma CVD
Kim DS