| Issue |
| Total 41 articles [ 키워드: Silicon ] |
| No. | Article |
| 21 |
Korean Journal of Chemical Engineering, 29 (9), pp.1272-1278 (2012) Preparation and characterization of ophthalmic polymers containing silicon nanoparticles Sung AY, Kim TH |
| 22 |
Korean Journal of Chemical Engineering, 27 (6), pp.1916-1921 (2010) Effects of exposure wavelength and surface preparation conditions on the generation of blister defects in organic insulator layer Cho M, Lee YB |
| 23 |
Korean Journal of Chemical Engineering, 27 (2), pp.567-569 (2010) Changes in total lipid contents of marine diatom Nitzschia frustulum at various temperatures under Si deficiency Ryu K, Rorrer GL |
| 24 |
Korean Journal of Chemical Engineering, 27 (2), pp.570-575 (2010) Improvement of cephalosporin C production by Acremonium chrysogenum M35 in submerged culture with glass beads or silicone rubber Lee HH, Song YS, Kim SW |
| 25 |
Korean Journal of Chemical Engineering, 27 (1), pp.320-323 (2010) CO2 conversion to O2 by chemical lung in the presence of potassium superoxide in the silicone polymer matrix Kim JH, Park YK, Jeong SK |
| 26 |
Korean Journal of Chemical Engineering, 26 (6), pp.1778-1784 (2009) Characterization of octadecyltrichlorosilane self-assembled monolayers on the silicon (100) surfaces Jung MH, Choi HS |
| 27 |
Korean Journal of Chemical Engineering, 26 (1), pp.285-287 (2009) Electrical characterizations of Neutron-irradiated SiC Schottky diodes Ko GW, Kim HY, Bang JN, et al. |
| 28 |
Korean Journal of Chemical Engineering, 25 (6), pp.1539-1545 (2008) Effects of silyl concentration, hydrogen concentration, ion flux, and silyl surface diffusion length on microcrystalline silicon film growth Wen S, Zhang L, Lu J, et al. |
| 29 |
Korean Journal of Chemical Engineering, 25 (4), pp.881-884 (2008) Silicon oxidation by aerial diffusion of active oxygen species from UV-irradiated TiO2 Ko CK, Lee WG |
| 30 |
Korean Journal of Chemical Engineering, 25 (2), pp.373-376 (2008) Reduction of proximity effect in electron beam lithography by deposition of a thin film of silicon dioxide Seo CH, Suh KY |
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