| Issue |
| Total 22 articles [ 저자: Hahn YB ] |
| No. | Article |
| 11 |
Korean Journal of Chemical Engineering, 22 (2), pp.334-338 (2005) Two-Step Growth of ZnO Films on Silicon by Atomic Layer Deposition Lee S, Im YH, Hahn YB |
| 12 |
Korean Journal of Chemical Engineering, 21 (6), pp.1235-1239 (2004) Inductively Coupled Plasma Etching of Ta, Co, Fe, NiFe, NiFeCo, and MnNi with Cl2/Ar Discharges Park HJ, Ra HW, Song KS, et al. |
| 13 |
Korean Journal of Chemical Engineering, 21 (1), pp.292-295 (2004) Structural and Optical Properties of InGaN/GaN Triangular-shape Quantum Wells with Different Threading Dislocation Densities Choi RJ, Lee HJ, Hahn YB, et al. |
| 14 |
Korean Journal of Chemical Engineering, 20 (6), pp.1134-1137 (2003) Improvement of Electrical and Optical Properties of InGaN/GaN-Based Light-Emitting Diodes with Triangular Quantum Well Structure Choi RJ, Hahn YB, Shim HW, et al. |
| 15 |
Korean Journal of Chemical Engineering, 19 (3), pp.486-490 (2002) Dry Etching of SrBi2Ta2O9: Comparison of Inductively Coupled Plasma Chemistries Park JS, Kim TH, Choi CS, et al. |
| 16 |
Korean Journal of Chemical Engineering, 19 (3), pp.519-523 (2002) High Yield Purification of Carbon Nanotubes with H2S-O2 Mixture Jeong T, Kim TH, Kim WY, et al. |
| 17 |
Korean Journal of Chemical Engineering, 19 (2), pp.347-350 (2002) Heat Transfer between Wafer and Electrode in a High Density Plasma Etcher Im YH, Hahn YB |
| 18 |
Korean Journal of Chemical Engineering, 17 (3), pp.304-309 (2000) A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System Hahn YB, Pearton SJ |
| 19 |
Korean Journal of Chemical Engineering, 15 (2), pp.217-222 (1998) EFFECT OF RAPID THERMAL ANNEALING ON THE STRUCTURAL AND ELECTRICAL PROPERTIES OF TiO2 THIN FILMS PREPARED BY PLASMA ENHANCED CVD Kim JW, Kim DO, Hahn YB |
| 20 |
Korean Journal of Chemical Engineering, 13 (5), pp.473-477 (1996) PREPARATION AND CHARACTERIZATION OF TiO2 THIN FILMS BY PECVD ON Si SUBSTRATE Lee IS, Kim JW, Youn CJ, et al. |
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