2-hydroxy-5-nonyl-acetophenoneoxime, di-2,4,4-trimethylpentyl phosphinic acid, a teriary amine were bound on the silica surface after surface modification. The adsorption of the metal chelating agents appears to be due to physical attraction such as van der Waals interactions and not covalent bonding. Stability tests show that the adsorbents are stable under acidic conditions. Batch tests were conducted for heavy metal ion adsorption and elution. Heavy metal ions which were adsorbed to the surface of the adsorbents could be recovered by elution with 0.1 M HCI.