Issue
Korean Journal of Chemical Engineering,
Vol.28, No.5, 1299-1303, 2011
Microwave synthesis of mesoporous WO3 doping with bismuth and photocatalytic oxidation of water to H2
Mesostructured tungstic acid was prepared from Na2WO4 with protonated cation-exchange using a surfactant cetyltrimethyl ammonium bromine (CTAB) as the structure-directing agent under microwave radiation. The surfactant was removed by high-temperature calcination, microwave radiation extraction and Soxhlet extraction, respectively. The effects of these methods for removal of the surfactant were investigated in detail. XRD, TEM, FT-IR and UV-Vis were employed to characterize the mesostructured materials. The results showed that the microwave extraction and Soxhlet extraction were favorable to the synthesis of mesostructured tungstic oxide. Mesoporous structure was destroyed as the calcining temperature rising to 823 K. The mesoporous structure of WO3 prepared by microwave radiation extraction had an average pore diameter of 3.4 nm and specific surface area of 120.46m2·g.1. And also, the mesoporous materials WO3 doping with Bi2O3 displayed much higher photocatalytic activity than commercial Degussa P25 TiO2 under visible light and UV irradiation.
[References]
  1. Iliev V, Tomova D, Bilyarska L, Prahov L, Petrov L, J. Photochem. Photobiol. A: Chem., 159, 281, 2003
  2. Warren Cross B, Ivan Parkin P, Shane O Neill A, Films Chem.Mater., 15, 2786, 2003
  3. Luo J, Hepel M, Electrochim. Acta, 46(19), 2913, 2001
  4. Kominami H, Kato JI, Murakami SY, Ishii Y, Kohno M, Yabutani KI, Yamamoto T, Kera Y, Inoue M, Inui T, Ohtani B, Catal. Today., 84, 186, 2003
  5. Gondal, et al, Chem. Phys. Lett., 111, 385, 2004
  6. Hameed A, Gondal MA, Yamani ZH, Catal. Commun., 715, 5, 2004
  7. Teoha LG, J. S., Laia WH, Hunga IM, Hona MH, J. Alloys Compounds., 251, 396, 2005
  8. Sallard S, Brezesinski T, Bernd MS, J. Phys. Chem. C., 7200, 111, 2007
  9. Cui XZ, Guo LM, Cui FM, He QJ, Shi J, J. Phys. Chem. C., 4134, 113, 2009
  10. Wei W, Dai Y, Huang BB, American Chem. Soc., 5658, 113, 2009
  11. Zou LX, Zhong Q, Liu QC, Transactions Mater. Heat Treat., 39, 26, 2005
  12. Zou LX, Zhong Q, Liu QC, Chem. Ind. Eng. Progress., 1015, 24, 2005
  13. Jiahe L, Zhaoxiang D, Xin J, Fuli L, Yadong L, Inorganic Chem., 234, 41, 2002
  14. Antonaia A, Santoro MC, Fameli G, Thin Solid Films., 281, 426, 2003
  15. Gabrusenoks J, Veispals A, Czarnowski A, Electrochim. Acta., 2229, 46, 2001
  16. Jan S, Dmitry HGS, Jianguang J, Chem. Mater., 5103, 14, 2002
  17. Yoshiko T, Junko NK, Tsuyoshi T, Chem. Mater., 1194, 13, 2001
  18. Yu CJ, Wang XC, Fu XZ, Chem. Mater., 1523, 16, 2004
  19. Hossam H, Yaron P, J. Phys. Chem. B., 2319, 107, 2003
  20. Rodrigues S, Uma S, Igor N, Martyanov, Klabunde KJ, J. Photochem. Photobiol. A: Chem., 51, 165, 2004