Issue
Korean Journal of Chemical Engineering,
Vol.24, No.6, 960-964, 2007
Electrodeposition of palladium on the copper lead frame: Electrode reaction characteristics and the effects of primary additives
This study is mainly concerned with the electrodeposition of palladium on the copper alloy lead frame used for semiconductor assembly process. The role and effect of additives on palladium electrodeposition were studied by using various electrochemical methods. Ortho-formylbenzenesulfonic acid as a primary additive was used in palladium plating on the lead frame in this study. The electrochemical characteristics of electrode reaction were measured by the hanging mercury drop electrode for electrochemical system and the qualities of the plated surface of lead frames were also examined. The additive agent in Pd solution could have been classified as the grain refiner. It acted as the electroactive species, which increased the polarization and decreased the roughness, by adsorption on the electrode in palladium pre-plated process. The reduction of palladium ion was identified to be an irreversible reaction and the diffusion coefficient of palladium ion and the reaction rate constant were obtained from chronopotentiometry experiment.
[References]
  1. Kim JD, Baek YH, Choi WS, Bok KS, Plat. and Surf. Fin., 86, 113, 1999
  2. Paek SK, Lee SH, Park SC, Proc. IMAPS2003, 2nd half Symposium, Korea, 2003
  3. Dini JW, Electrodeposition, Noyes Publication, New Jersey, 1994
  4. Hartley FR, The chemistry of platinum and palladium, John Wiley and Sons, New York, 1973
  5. Lovie, Et AL, United States Patent, 4,715,935, 1987
  6. Bard AJ, Faulkner LR, Electrochemical methods, John Wiley & Sons, Inc. , New York, 1994
  7. Brett CMA, Brett AMO, Electrochemistry, Oxford University Press, London, 1993
  8. Le Penven R, Levason W, Pletcher D, J. Appl. Electrochem., 22, 421, 1992
  9. Lide DR, CRC hand book of chemistry and physics, 77th, Ed., CRC Press, Boca Raton (1996-1997)
  10. Ogden C, Tench D, White J, J. Appl. Electrochem., 12, 619, 1982
  11. Troyon M, Wang L, Appl. Surf. Sci., 103, 517, 1996
  12. Yu J, Chen Y, Yang H, Huang Q, J. Electrochem., 146, 1798, 1999
  13. Crosby JN, Harrison JA, Whitfield TA, Electrochim. Acta, 26, 11, 1981
  14. Jaworski RK, Cox JA, J. Electroanal. Chem., 325, 111, 1992