Issue
Korean Journal of Chemical Engineering,
Vol.32, No.4, 583-596, 2015
A unified approach for proportional-integral-derivative controller design for time delay processes
An analytical design method for PI/PID controller tuning is proposed for several types of processes with time delay. A single tuning formula gives enhanced disturbance rejection performance. The design method is based on the IMC approach, which has a single tuning parameter to adjust the performance and robustness of the controller. A simple tuning formula gives consistently better performance as compared to several well-known methods at the same degree of robustness for stable and integrating process. The performance of the unstable process has been compared with other recently published methods which also show significant improvement in the proposed method. Furthermore, the robustness of the controller is investigated by inserting a perturbation uncertainty in all parameters simultaneously, again showing comparable results with other methods. An analysis has been performed for the uncertainty margin in the different process parameters for the robust controller design. It gives the guidelines of the Ms setting for the PI controller design based on the process parameters uncertainty. For the selection of the closed-loop time constant, (τc), a guideline is provided over a broad range of θ/τ ratios on the basis of the peak of maximum uncertainty (Ms). A comparison of the IAE has been conducted for the wide range of θ/τ ratio for the first order time delay process. The proposed method shows minimum IAE in compared to SIMC, while Lee et al. shows poor disturbance rejection in the lag dominant process. In the simulation study, the controllers were tuned to have the same degree of robustness by measuring the Ms, to obtain a reasonable comparison.
[References]
  1. Desborough LD, Miller RM, Increasing customer value of industrial control performance monitoring.Honeywell’s experience, in Chemical Process Control .VI AIChE Symposium Series, Tuscon, Arizona, Jan. 2001, 2002., 2001
  2. Kano M, Ogawa M, J. Process Control, 20(9), 969, 2010
  3. Rivera D, Morari M, Skogestad S, Ind. Eng. Chem. Process Des. Dev., 25, 252, 1986
  4. Morari M, Zafiriou E, Robust Process Control, NJ: Prentice-Hall Englewood Cliffs, NJ (1989)., 1989
  5. Horn IG, Arulandu JR, Gombas CJ, Vanantwerp JG, Braatz RD, Ind. Eng. Chem. Res., 35(10), 3437, 1996
  6. Lee Y, Park S, Lee M, Brosilow C, AIChE J., 44(1), 106, 1998
  7. Skogestad S, J. Process Control, 13(4), 291, 2003
  8. Chien IL, Fruehauf P, Chem. Eng. Prog., 86, 33, 1990
  9. Shamsuzzoha M, Lee M, Ind. Eng. Chem. Res., 46(7), 2077, 2007
  10. Seborg D, Edgar T, Mellichamp D, Process Dynamics and Control, New York, Wiley (2004)., 2004
  11. Chen D, Seborg DE, Ind. Eng. Chem. Res., 41(19), 4807, 2002
  12. Lee Y, Lee J, Park S, Chem. Eng. Sci., 55(17), 3481, 2000
  13. Yang XP, Wang QG, Hang CC, Lin C, Ind. Eng. Chem. Res., 41(17), 4288, 2002
  14. Wang YG, Cai WJ, Ind. Eng. Chem. Res., 41(12), 2910, 2002
  15. Tan W, Marquez HJ, Chen TW, J. Process Control, 13(3), 203, 2003
  16. Liu T, Zhang WD, Gu DY, J. Process Control, 15(5), 559, 2005
  17. Jung CS, Song HK, Hyun CJ, J. Process Control, 9, 265, 1999
  18. Majhi S, Atherton DP, Automatica, 36(11), 1651, 2000
  19. Kwak HJ, Sung SW, Lee IB, Park JY, Ind. Eng. Chem. Res., 38(2), 405, 1999
  20. Zhang WD, Gu DY, Wang W, Xu XM, Ind. Eng. Chem. Res., 43(1), 56, 2004
  21. Tyreus BD, Luyben W, Ind. Eng. Chem. Res., 31, 2625, 1992
  22. Luyben WL, Ind. Eng. Chem. Res., 35(10), 3480, 1996
  23. Shamsuzzoha M, Moonyong Lee M, Korean J. Chem. Eng., 25(4), 637, 2008
  24. Shamsuzzoha M, Lee SH, Lee MY, Korean J. Chem. Eng., 26(3), 622, 2009
  25. Vu TNL, Lee M, Korean J. Chem. Eng., 30(3), 546, 2013
  26. Grimholt C, Skogestad S, Optimal PI control and verification of the SIMC tuning rule, in Proceedings of the IFAC Conference on Advances in PID Control PID’12, Brescia (Italy) (2012)., 2012
  27. Skogestad S, Grimholt C, The SIMC Method for Smooth PID Controller, in PID Control in the Third Millennium, Advances in Industrial Control, Springer, 147 (2012)., 2012
  28. Ziegler JG, Nichols NB, Trans. ASME, 64, 759, 1942
  29. Shamsuzzoha M, Skogestad S, J. Process Control, 20(10), 1220, 2010
  30. Hu W, Xiao G, Ind. Eng. Chem. Res., 2011, 2461, 2011
  31. Haugen F, Modeling, Identification Control, 31, 79, 2010
  32. Seki H, Shigemasa T, J. Process Control, 20(1), 217, 2010
  33. Veronesi M, Visioli A, J. Process Control, 20(3), 261, 2010
  34. Alcantara S, Vilanova R, Pedret C, J. Process Control, 23(4), 527, 2013
  35. Alcantara S, Pedret C, Vilanova R, J. Process Control, 20(5), 596, 2010
  36. Alcantara S, Zhang WD, Pedret C, Vilanova R, Skogestad S, J. Process Control, 21(6), 976, 2011
  37. Alcantara S, Vilanova R, Pedret C, Skogestad S, A look into robustness/performance and servo/regulation issues in PI tuning, in Proceedings of the IFAC Conference on Advances in PID Control PID’12, Brescia, Italy (2012)., 2012
  38. Lee J, Cho W, Edgar TF, Ind. Eng. Chem. Res., 52, 12973, 2013
  39. Torrico BC, Cavalcante MU, Braga APS, Normey-Rico JE, Albuquerque AAM, Ind. Eng. Chem. Res., 52(33), 11646, 2013
  40. Shamsuzzoha M, Ind. Eng. Chem. Res., 52, 12973, 2013
  41. Alfaro VM, Vilanova R, Optimal robust tuning for 1DoF PI/PID control unifying FOPDT/SOPDT models, in IFAC Conference on Advances in PID Control PID’12, Brescia (Italy), March 28-30 (2012)., 2012
  42. Isaksson AJ, Graebe SF, IEE Proc.-Control Theory Appl., 149(1), 41, 2002
  43. Visioli A, Practical PID Control, London (UK), Springer (2006)., 2006
  44. Shamsuzzoha M, Skliar M, Lee M, Asia-Pacific J. Chem. Eng., 7, 93, 2012