| Issue |
| Total 2 articles [ 키워드: Plasma Deposition ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 40 (6), pp.1268-1276 (2023) Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes Jie Li, Heeyeop Chae |
| 2 |
Korean Journal of Chemical Engineering, 12 (5), pp.572-575 (1995) EFFECT OF FLUORINE CHEMISTRY IN THE REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON FILMS FROM Si2H6-SiF4-H2 Kim DH, Lee IJ, Rhee SW, et al. |
