| Issue |
| Total 2 articles [ 키워드: ICP Etcher ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 23 (2), pp.199-202 (2006) Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application Seo ST, Lee KS, Yang DR |
| 2 |
Korean Journal of Chemical Engineering, 22 (6), pp.822-829 (2005) Run-to-Run Control of Inductively Coupled C2F6 Plasma Etching of SiO2: Construction of a Numerical Process with a Computational Fluid Dynamics Code Seo ST, Lee YH, Lee KS, et al. |
