| Issue |
| Total 1 articles [ 키워드: Hot Filament Chemical Vapor Deposition (HFCVD) ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 31 (7), pp.1271-1275 (2014) Effects of cobalt and cobalt oxide buffer layers on nucleation and growth of hot filament chemical vapor deposition diamond films on silicon (100) Dar MA, Abuhimd H, Ahmad I, et al. |
