| Issue |
| Total 4 articles [ 키워드: HFCVD ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 31 (7), pp.1271-1275 (2014) Effects of cobalt and cobalt oxide buffer layers on nucleation and growth of hot filament chemical vapor deposition diamond films on silicon (100) Dar MA, Abuhimd H, Ahmad I, et al. |
| 2 |
Korean Journal of Chemical Engineering, 22 (5), pp.770-773 (2005) Comparative Study of Diamond Films Grown on Silicon Substrate Using Microwave Plasma Chemical Vapor Deposition and Hot-Filament Chemical Vapor Deposition Technique Dar MA, Kim YS, Ansari SG, et al. |
| 3 |
Korean Journal of Chemical Engineering, 21 (1), pp.262-266 (2004) Nucleation of Diamond over Nanotube Coated Si Substrate Using Hot Filament Chemical Vapor Deposition (CVD) System Ansari SG, Seo HK, Kim GS, et al. |
| 4 |
Korean Journal of Chemical Engineering, 20 (6), pp.1154-1157 (2003) Lonsdaleite Diamond Growth on Reconstructed Si (100) by Hot-Filament Chemical Vapor Deposition (HFCVD) Chiem CV, Seo HK, Ansari SG, et al. |
