Issue
Total 1 articles [ 키워드: Filament-substrate Distance ]
No. Article
1 Korean Journal of Chemical Engineering, 31 (7), pp.1271-1275 (2014)
Effects of cobalt and cobalt oxide buffer layers on nucleation and growth of hot filament chemical vapor deposition diamond films on silicon (100)
Dar MA, Abuhimd H, Ahmad I, et al.