| Issue |
| Total 4 articles [ 키워드: Deposition Rate ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 19 (3), pp.391-399 (2002) Mathematical Modeling for Chemical Vapor Deposition in a Single-Wafer Reactor: Application to Low-Pressure Deposition of Tungsten Park JH |
| 2 |
Korean Journal of Chemical Engineering, 15 (6), pp.652-657 (1998) A Study of Deposition Rate and characterization of BN Thin Films Prepared by CVD Jin YG, Lee SY, Nam YW, et al. |
| 3 |
Korean Journal of Chemical Engineering, 13 (5), pp.473-477 (1996) PREPARATION AND CHARACTERIZATION OF TiO2 THIN FILMS BY PECVD ON Si SUBSTRATE Lee IS, Kim JW, Youn CJ, et al. |
| 4 |
Korean Journal of Chemical Engineering, 13 (5), pp.515-521 (1996) MANUFACTURING OF CERAMIC COMPO- SITES REINFORCED WITH LAYERED WOVEN FABRICS BY CVI OF SiC FROM DI- CHLORODIMETHYLSILANE Cho MS, Kim JW, Chung GY |
