| Issue |
| Total 1 articles [ 저자: Choi BK ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 22 (6), pp.822-829 (2005) Run-to-Run Control of Inductively Coupled C2F6 Plasma Etching of SiO2: Construction of a Numerical Process with a Computational Fluid Dynamics Code Seo ST, Lee YH, Lee KS, et al. |
