Articles & Issues
- Language
- English
- Conflict of Interest
- In relation to this article, we declare that there is no conflict of interest.
- Publication history
-
Received August 7, 2016
Accepted November 20, 2016
-
This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.
All issues
Minimizing loss in LCD glass manufacturing by cutting pattern optimization based on integer programming
Department of Nuclear and Energy System Engineering, Dongguk University, Gyeongju 38066, Korea 1Department of Chemical Engineering, POSTECH, Pohang 37673, Korea
Korean Journal of Chemical Engineering, April 2017, 34(4),
10.1007/s11814-016-0328-7
10.1007/s11814-016-0328-7
Download PDF
Abstract
Loss reduction plays a critical role in improving both process efficiency and overall profitability. As processes become more complex, loss reduction becomes more challenging and systematic decision-supporting methods are thus needed. This paper illustrates such a method in the context of liquid crystal display (LCD) glass production, which involves a series of chemical processes. Loss-minimizing integer programming models are proposed to compute a cutting pattern that allocates multiple demands to LCD mother glass. Numerical examples from actual LCD glass processes are presented to illustrate the applicability of the proposed method.
Keywords
References
Wascher G, Hauβner H, Schumann H, Eur. J. Oper. Res., 183, 1109 (2007)
Lodi A, Martello S, Monaci M, Eur. J. Oper. Res., 141, 241 (2002)
Martello S, Monaci M, Vigo D, Informs J. Comput., 15, 310 (2003)
Lodi A, Martello S, Vigo D, J. Comb. Optim., 8, 363 (2004)
Puchinger J, Raidl GR, Eur. J. Oper. Res., 183, 1304 (2007)
Cintra GF, Miyazawa FK, Wakabayashi Y, Xavier EC, Eur. J. Oper. Res., 191, 59 (2008)
Alvarez-Valdes R, Parreno F, Tamarit JM, OR Spectrum, 31(2), 431 (2009)
Gilmore PC, Gomory RE, Oper. Res., 13, 94 (1965)
Correia I, Gouveia L, Saldanha-da-Gama F, Comput. Oper. Res., 35, 2103 (2008)
Macedo R, Alves C, Valerio de Carvalho JM, Comput. Oper. Res., 37, 991 (2010)
Silva E, Alvelos F, Valerio de Carvalho JM, Eur. J. Oper. Res., 205, 699 (2010)
Dyckhoff H, Oper. Res., 29, 1092 (1981)
Park KT, Ryu JH, Lee HK, Lee IB, J. Chem. Eng. Jpn., 45(3), 219 (2012)
Park KT, Ryu JH, Lee HK, Lee IB, Korean J. Chem. Eng., 30(2), 278 (2013)
Park KT, Kim H, Lee S, Lee HK, Ryu JH, Lee IB, Comput. Chem. Eng., 48, 312 (2013)
Lodi A, Martello S, Monaci M, Eur. J. Oper. Res., 141, 241 (2002)
Martello S, Monaci M, Vigo D, Informs J. Comput., 15, 310 (2003)
Lodi A, Martello S, Vigo D, J. Comb. Optim., 8, 363 (2004)
Puchinger J, Raidl GR, Eur. J. Oper. Res., 183, 1304 (2007)
Cintra GF, Miyazawa FK, Wakabayashi Y, Xavier EC, Eur. J. Oper. Res., 191, 59 (2008)
Alvarez-Valdes R, Parreno F, Tamarit JM, OR Spectrum, 31(2), 431 (2009)
Gilmore PC, Gomory RE, Oper. Res., 13, 94 (1965)
Correia I, Gouveia L, Saldanha-da-Gama F, Comput. Oper. Res., 35, 2103 (2008)
Macedo R, Alves C, Valerio de Carvalho JM, Comput. Oper. Res., 37, 991 (2010)
Silva E, Alvelos F, Valerio de Carvalho JM, Eur. J. Oper. Res., 205, 699 (2010)
Dyckhoff H, Oper. Res., 29, 1092 (1981)
Park KT, Ryu JH, Lee HK, Lee IB, J. Chem. Eng. Jpn., 45(3), 219 (2012)
Park KT, Ryu JH, Lee HK, Lee IB, Korean J. Chem. Eng., 30(2), 278 (2013)
Park KT, Kim H, Lee S, Lee HK, Ryu JH, Lee IB, Comput. Chem. Eng., 48, 312 (2013)
