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Conflict of Interest: In relation to this article, we declare that there is no conflict of interest.

Publication history: Received May 4, 2013
Accepted February 24, 2014

This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Use of P-1 model with the additional source term for numerical simulation of ultraviolet radiation in a photoreactor

Baoqing Deng^† Daqiang Ge Li Lu Di Ge Jiajia Li Yuan Guo Chang Nyung Kim^1†

Department of Environmental Science and Engineering, University of Shanghai for Science and Technology, Shanghai 200093, P. R. China ¹College of Engineering, Kyung Hee University, Yongin 446-701, Korea

bqdeng@usst.edu.cn

Korean Journal of Chemical Engineering, June 2014, 31(6), 956-960(5), 10.1007/s11814-014-0066-7

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Abstract

Radiation distribution in a photoreactor with multiple mediums is solved by the P-1 model. The UV lamp is included in the computational domain. An additional source term method is presented to describe the generation of UV light, which can avoid the use of analytical lamp emission model at the lamp surface. The boundary condition for incident radiation at the semi-transparent wall between adjacent mediums has been derived to link the P-1 equations in adjacent mediums, which enables the present model to adapt to the photoreactor with complicated structure. The_x000D_ predicted incident radiation agrees well with the experimental data in literature. The effects of absorption coefficient, scattering coefficient and phase function of lamp plasma on the radiation distribution are discussed in detail.

Keywords

P-1 Model UV Reactor Radiation Distribution Multiple Mediums

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