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In relation to this article, we declare that there is no conflict of interest.
Publication history
Received August 5, 2008
Accepted September 3, 2008
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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Enhanced light emission of nano-patterned GaN via block copolymer thin films

School of Chemical and Biological Engineering, Seoul National University, Seoul 151-744, Korea 1Samsung Advanced Institute of Technology, Yongin-si, Gyeonggi-do 446-712, Korea 2School of Advanced Materials Engineering, Kookmin University, Seoul 136-70, Korea 3Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea
shin@snu.ac.kr
Korean Journal of Chemical Engineering, January 2009, 26(1), 277-280(4), 10.1007/s11814-009-0047-4
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Abstract

Abstract.We demonstrate that the nanoscopic block copolymer patterns on GaN can enhance light extraction efficiency of GaN-based light emitting diodes. Nanoporous patterns were fabricated on a bare GaN substrate via self-assembly of poly(styrene-b-methyl methacrylate) block copolymers from which PMMA microdomains were selectively removed later on. A bare GaN surface was treated with a photo-crosslinkable thin layer of poly(styrene-r-methyl_x000D_ methacrylate) random copolymers to tune the cylindrical microdomain orientations. The nanoporous block copolymer thin film was controlled to be thicker than its typical repeat period in bulk by incorporating PMMA homopolymer into block copolymer. Consequently, the light extraction efficiency in photoluminescence spectra could be tuned with the thickness of nanopatterned thin film on GaN.

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