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Issue
Korean Journal of Chemical Engineering,
Vol.32, No.2, 199-201, 2015
Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor
Choi E, Kim A, Kwon SH, Cui Y, Lee SJ, Lee U, Choi HS, Hahn SJ, Yoon SP, Son HB, Pyo SG
This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.
Keywords: CMOS Image Sensor; CMP; Focal Length; White Sensitivity; Dead Zone
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[Cited By]
  1. Lee YS, Kim JM, Koo JH, KiM TH, Kim DH, Korean Journal of Chemical Engineering, 35(1), 1, 2018
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