| Issue |
| Total 2 articles [ 키워드: CMP ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 32 (2), pp.199-201 (2015) Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor Choi E, Kim A, Kwon SH, et al. |
| 2 |
Korean Journal of Chemical Engineering, 23 (5), pp.784-788 (2006) Kinetic modeling for chromatographic separation of cytosine monophosphate and uracil monophosphate Chen Y, Dai W, Liu X, et al. |
