This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.
Wuu SG, Chien HC, Yaung DN, Tseng CH, Wang CS, Chang CK, Hsaio YK, International Electron Devices Meeting, 551, 2001
Hurwitz J, Smith SG, Murray AA, Denyer PB, Thomson J, Anderson S, Duncan E, Kinsey A, Paisley B, Pugibet PF, Christison E, Laffoley B, Panaghiston M, Bradshaw S, Vittu J, Brechignac R, Findlater KM, ISSCC Digest of Technical Papers, San Francisco, 2001
Jin X, Fan X, Liu Z, Kuang Z, Yang J, Microelectron. Eng., 87, 631, 2010
Kawano S, Smith NI, Yamanaka M, Kawata S, Fujita K, Appl. Phys. Express, 042401.1, 4, 2011