Korean Chemical Engineering Research, Vol.45, No.6, 648-655, 2007
UV, H2O2, 오존을 이용한 고급산화공정에서의 테레프탈산 제조공정 폐수 처리 : 유기물 및 색도제거 연구
Advanced Oxidation Process for the Treatment of Terephthalic Acid Wastewater using UV, H2O2 and O3 : Organic and Color Removal Studies
UV/H2O2, O3, O3/H2O2, UV/H2O2/O3 공정을 이용한 테레프탈산 제조공정 폐수의 COD 및 색도제거 연구를 수행하였다. UV/H2O2, O3, O3/H2O2, UV/H2O2/O3 공정에서의 COD 제거율은 각각 10, 48, 56, 63%, 색도 제거율은 UV/H2O2 공정이 80%, O3, O3/H2O2, UV/H2O2/O3 공정은 모두 99% 이상 효과적으로 제거되는 것으로 나타났다. COD 및 색도 제거율이 가장 우수한 UV/H2O2/O3 공정에서 테레프탈산 제조공정 폐수의 주요 유기물 성분인 테레프탈산, 이소프탈산 그리고 벤조산 성분은 120분 이내에 모두 99% 이상 제거되었다. 또한 UV/H2O2, O3/H2O2, UV/H2O2/O3 공정에서의 최적 H2O2 주입농도는 각각 0.5M, 25 mM 그리고 5 mM로 나타나, UV와 H2O2를 오존산화 공정에 조합함으로써 유기물 제거율 향상과 함께 사용된 H2O2의 저감효과를 동시에 얻을 수 있었다.
UV/H2O2, O3, O3/H2O2, UV/H2O2/O3 processes were tested for the removal of COD and color from terephthalic acid wastewater. COD removal efficiencies were 10, 48, 56, 63% in the UV/H2O2, O3, O3/H2O2, UV/H2O2/O3 process respectively. Color removal efficiency of UV/H2O2 process was 80% and O3, O3/H2O2, UV/H2O2/O3 processes were almost more than 99%. Terephthalic acid, isophthalic acid and benzoic acid were completely destructed in terephthalic wastewater within 120 min by UV/H2O2/O3 process and shows high COD and color removal efficiencies. The optimum concentration of H2O2 dosage was found to be 0.5 M, 25 mM and 5 mM for UV/H2O2, O3/H2O2 and UV/H2O2/O3 processes respectively, Organic destruction efficiency was enhanced and also reducing the consumption of H2O2 dosage by combining UV, H2O2 and O3 process.
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Kwon SC, Kim JY, Yoon SM, Bae W, Kang KS, Rhee YW, Journal of Industrial and Engineering Chemistry , 18 (6), 1951, 2012
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