Korean Chem. Eng. Res.
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ISSN 0304-128X
Online:
ISSN 2233-9558
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Issue
Total
1
articles [
저자
:
박영배
]
No.
Article
1
HWAHAK KONGHAK
,
34
(2), pp.143-148 (1996)
원거리 플라즈마 화학증착을 이용한 저온 이산화규소박막의 제조
Remote Plasma Chemical Vapor Deposition(RPCVD) of Low Temperature Silicon Oxide
박영배
, 강진규, 이시우
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