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새로운 비전통적 나노리소그라피 공정
New Unconventional Nanolithographic Methods
성균관대학교 화학공학과, 151-742 1, 151-742 2서울대학교 화학생물공학부, 151-742
School of Chemical Engineering, Seoul National University, San 56-1, Shilim-dong, Kwanak-gu, Seoul 151-742, Korea
honghlee@plaza.snu.ac.kr
HWAHAK KONGHAK, February 2003, 41(1), 1-14(14), NONE
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Abstract
본 총설에서는 나노 형상 및 나노 구조체의 제작에 있어서 기존의 노광 공정을 이용하는 대신, 물리적 접촉법을 통해서 형상을 구현하는 비전통적 패터닝 방법을 소개하였다. 이에 기존 노광 공정의 비용 및 기술적 문제를 극복하는 대안으로써 나노 각인 리소그라피법과 연성 리소그라피법을 제시하였다. 이들 공정은 주형을 이용하여 반복적으로 형상을 구현함으로써 경제적인 공정을 구현하면서도, 곡면상에의 형상 구현까지도 가능한 기술적 장점을 가지고 있다. 더 나아가, 이들 공정의 단점을 보완함과 동시에 산업적 이용가치를 높인 공정으로써 상온 각인 리소그라피법, 모세관력 리소그라피법 및 연성 성형법을 제시하였다. 이를 통해 간단한 공정만으로도 복잡한 구조나 3차원 구조의 나노 형상을 자유로이 제조할 수 있었다.
This review is on unconventional nanolithographies that can replace the conventional photolithography. All these techniques utilize a patterned mold and the patterning is realized by physical contact of the mold with the underlying polymer layer. They are cost-effective, applicable to small feature sizes that cannot be defined by photolithography, and to an extent_x000D_
applicable to non-planar surfaces. Imprint and soft lithographies are reviewed first, which is then followed by new lithographies of room-temperature imprint lithography, capillary force lithography and soft molding. These new techniques are also efficient and cost-effective in fabricating complex or three-dimensional patterns and structures.
Keywords
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Suh KY, Kim YS, Lee HH, Adv. Mater., 13(18), 1386 (2001)
Kim Ys, Suh KY, Lee HH, Appl. Phys. Lett., 79(14), 2285 (2001)
Canning J, J. Vac. Sci. Technol. B, 15(6), 2109 (1997)
Sze SM, Semiconductor Devices: Physics and Technology, John Wiley, New York (1985)
Chou SY, Krauss PR, Zhang W, Guo LJ, Zhuang L, J. Vac. Sci. Technol. B, 15(6), 2897 (1997)
Guo L, Krauss PR, Chou SY, Appl. Phys. Lett., 71(13), 1881 (1997)
Khang DY, Lee HH, Appl. Phys. Lett., 76(7), 870 (2000)
Khang DY, Yoon H, Lee HH, Adv. Mater., 13(10), 749 (2001)
Xia YN, McClelland JJ, Gupta R, Qin D, Zho XM, Sohn LL, Celotta RJ, Whitesides GM, Adv. Mater., 9(2), 147 (1997)
Larsen NB, Biebuyck H, Delamarche E, Michel B, J. Am. Chem. Soc., 119(13), 3017 (1997)
Jackman RJ, Wilbur JL, Whitesides GM, Science, 269(5224), 664 (1995)
Kim E, Xia YN, Zhao XM, Whitesides GM, Adv. Mater., 9(8), 651 (1997)
vanKrevelen DW, Properties of Polymers, 3rd ed., Elsevier, Amsterdam (1990)
Elias HG, Macromolecules, vol. 1, Plenum Press, New York (1984)
Suh KY, Lee HH, Adv. Func. Mater., 12(6-7), 405 (2002)
Suh KY, Lee HH, J. Chem. Phys., 115(17), 8204 (2001)
Schmid H, Michel B, Macromolecules, 33(8), 3042 (2000)
Adamson AW, Gast AP, Physical Chemistry of Surfaces, John Wiley, New York (1997)
Myers D, Surfaces, Interfaces, and Colloids, VCH, New York (1991)
Kim YS, Park J, Lee HH, Appl. Phys. Lett., 81(6), 1011 (2002)
Marzolin C, Smith SP, Prentiss M, Whitesides GM, Adv. Mater., 10(8), 571 (1998)
Duffy DC, McDonald Jc, Schueller OJA, Whitesides GM, Anal. Chem., 70(11), 4974 (1998)