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새로운 비전통적 나노리소그라피 공정

New Unconventional Nanolithographic Methods

성균관대학교 화학공학과, 151-742 1, 151-742 2서울대학교 화학생물공학부, 151-742
School of Chemical Engineering, Seoul National University, San 56-1, Shilim-dong, Kwanak-gu, Seoul 151-742, Korea
honghlee@plaza.snu.ac.kr
HWAHAK KONGHAK, February 2003, 41(1), 1-14(14), NONE
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Abstract

본 총설에서는 나노 형상 및 나노 구조체의 제작에 있어서 기존의 노광 공정을 이용하는 대신, 물리적 접촉법을 통해서 형상을 구현하는 비전통적 패터닝 방법을 소개하였다. 이에 기존 노광 공정의 비용 및 기술적 문제를 극복하는 대안으로써 나노 각인 리소그라피법과 연성 리소그라피법을 제시하였다. 이들 공정은 주형을 이용하여 반복적으로 형상을 구현함으로써 경제적인 공정을 구현하면서도, 곡면상에의 형상 구현까지도 가능한 기술적 장점을 가지고 있다. 더 나아가, 이들 공정의 단점을 보완함과 동시에 산업적 이용가치를 높인 공정으로써 상온 각인 리소그라피법, 모세관력 리소그라피법 및 연성 성형법을 제시하였다. 이를 통해 간단한 공정만으로도 복잡한 구조나 3차원 구조의 나노 형상을 자유로이 제조할 수 있었다.
This review is on unconventional nanolithographies that can replace the conventional photolithography. All these techniques utilize a patterned mold and the patterning is realized by physical contact of the mold with the underlying polymer layer. They are cost-effective, applicable to small feature sizes that cannot be defined by photolithography, and to an extent_x000D_ applicable to non-planar surfaces. Imprint and soft lithographies are reviewed first, which is then followed by new lithographies of room-temperature imprint lithography, capillary force lithography and soft molding. These new techniques are also efficient and cost-effective in fabricating complex or three-dimensional patterns and structures.

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