Issue
Korean Journal of Chemical Engineering,
Vol.33, No.2, 726-734, 2016
Characteristics of pressure drop during the pulse-jet cleaning of a ceramic filter for high temperature and high pressure
The operation range of the pressure drop between the peak and the base line during the pulse-jet cleaning of a ceramic filter relates closely with the grouping number of the filter elements in the filter unit, as well as the design and the operation conditions of the pulse cleaning system. A semi-empirical model was developed to predict the pressure drop of the filter unit versus the operation time according to the grouping numbers of the total filter elements in this study. The model is based on theoretical considerations and the application of the experimental data to develop a simple equation, which should be useful for preliminary design and operational inspection. The semi-empirical formula predicts the operational values of the pressure drop between the peak and the base line, which suggests the guideline for grouping of the filter elements for the pulse-jet cleaning. Peak pressure drop decreases gradually and then finally approaches a minimum stable value as the number of the cleaning group increases. Otherwise, the base line pressure drop increases gradually and then finally approaches a maximum stable value as the number of the cleaning group increases. Thus, the gaps between the peak and the base line pressure drop become narrow as the number of cleaning group increases. This phenomenon of gap reduction is desirable for the pulse cleaning of the filter element as it reduces the pulse cleaning load. Moreover, pulse cleaning becomes more effective as the number of the cleaning groups increases.
[References]
  1. Seville JPK, Ivatt S, Burnard GK, High Temperature Gas Cleaning, Ed. by Schmidt E, et al., University of Karlsruhe, 23 (1996).
  2. Heidenreich S, Fuel, 104, 83, 2013
  3. Dou BL, Wang C, Chen HS, Song YC, Xie BZ, Xu YJ, Tan CQ, Chem. Eng. Res. Des., 90(11), 1901, 2012
  4. SCHULZ K, DURST M, Filtr. Sep., 31(1), 25, 1994
  5. Chi HC, Yu L, Choi JH, Ji ZL, Chin. J. Chem. Eng., 16(2), 306, 2008
  6. Ji ZL, Shi MX, Ding FX, Powder Technol., 139(3), 200, 2004
  7. Schildermans I, Baeyens J, Smolders K, Filtr. Sep., 41(5), 26, 2004
  8. Mazaheri AR, Ahmadi G, Adv. Powder Technol., 17(6), 623, 2006
  9. Ji ZL, Peng S, Tan LC, Chin. J. Chem. Eng., 11(6), 626, 2003
  10. Ahmadi G, Smith DH, Aerosol Sci. Technol., 36, 665, 2002
  11. Choi JH, Seo YG, Chung JW, Powder Technol., 114(1-3), 129, 2001
  12. Grannell SK, Seville JPK, Proceedings of the 4th International Symposium on Gas Cleaning at High Temperatures, Dittler A, et al. Ed., Karlsruhe, Germany, 96 (1999).
  13. Smith DH, Powell V, Ahmadi G, Ibrahim E, Powder Technol., 94(1), 15, 1997
  14. Simon X, Chazelet S, Thomas D, Bemer D, Regnier R, Powder Technol., 172(2), 67, 2007
  15. Choi JH, Park GW, Energy Eng. J., 8(1), 143, 1999
  16. Choi JH, Ha SJ, Park YO, Korean J. Chem. Eng., 19(4), 711, 2002
  17. Choi JH, Ha SJ, Bak YC, Park YO, Korean J. Chem. Eng., 19(6), 1085, 2002
  18. Choi JH, Bak YC, Jang HJ, Kim JH, Kim JH, Korean J. Chem. Eng., 21(3), 726, 2004
  19. Endo Y, Chen DR, Pui DYH, Powder Technol., 98(3), 241, 1998
  20. Choi JH, Ha SJ, Jang HJ, Powder Technol., 140(1-2), 106, 2004
  21. Gupta A, Novick VJ, Bisawas P, Monson PR, Aerosol Sci. Technol., 19, 94, 1993
  22. Dennis R, Dirgo JA, Filtr. Sep., 18, 394, 1981
  23. Silva CRN, Negrini VS, Aguiar ML, Coury JR, Powder Technol., 101(2), 165, 1999
  24. Kim JH, Liang Y, Sakong KM, Choi JH, Bak YC, Powder Technol., 181(1), 67, 2008
  25. Aguiar ML, Coury JR, Ind. Eng. Chem. Res., 35(10), 3673, 1996
  26. Lupion M, Alonso-Farinas B, Rodriguez-Galan M, Navarrete B, Chem. Eng. Process., 66, 12, 2013