| Issue |
| Total 8 articles [ 키워드: Sputtering ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 39 (7), pp.1946-1951 (2022) Magnetic properties affected by structural properties of sputtered Ni/Cu multilayer films with different thicknesses of Ni layers Colmekci S, Karpuz A, Kockar H |
| 2 |
Korean Journal of Chemical Engineering, 37 (8), pp.1352-1359 (2020) Photocatalytic water splitting using hygroscopic MgO modified TiO2/WO3 dual-layer photocatalysts Huang CW, Liao CH, Wu JCS |
| 3 |
Korean Journal of Chemical Engineering, 32 (6), pp.1075-1080 (2015) Effect of Pt coverage in Pt-deposited Pd nanostructure electrodes on electrochemical properties Park AR, Lee YW, Kwak DH, et al. |
| 4 |
Korean Journal of Chemical Engineering, 29 (5), pp.676-679 (2012) Effects of nitrogen flow rate on titanium nitride films deposition by DC facing target sputtering method Kim HT, Park JY, Park C |
| 5 |
Korean Journal of Chemical Engineering, 26 (4), pp.1034-1039 (2009) Electrochemical characteristics of amophous carbon coated silicon electrodes Vovk OM, Na BK, Cho BW, et al. |
| 6 |
Korean Journal of Chemical Engineering, 26 (2), pp.392-397 (2009) Enhanced photocatalytic oxidation properties in Pt-TiO2 thin films by grounding Nam WS, Park JH, Han GY |
| 7 |
Korean Journal of Chemical Engineering, 23 (5), pp.832-837 (2006) Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400 ℃ Park HY, Nam SC, Lim YC, et al. |
| 8 |
Korean Journal of Chemical Engineering, 18 (1), pp.61-66 (2001) A Study on the Fabrication of an RTD (Resistance Temperature Detector) by Using Pt Thin Film Kim J, Kim J, Shin Y, et al. |
