| Issue |
| Total 1 articles [ 키워드: R2R Control ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 23 (2), pp.199-202 (2006) Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application Seo ST, Lee KS, Yang DR |
