| Issue |
| Total 1 articles [ 키워드: Plasma Model ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 25 (6), pp.1539-1545 (2008) Effects of silyl concentration, hydrogen concentration, ion flux, and silyl surface diffusion length on microcrystalline silicon film growth Wen S, Zhang L, Lu J, et al. |
