| Issue |
| Total 2 articles [ 키워드: Photoresist ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 27 (6), pp.1916-1921 (2010) Effects of exposure wavelength and surface preparation conditions on the generation of blister defects in organic insulator layer Cho M, Lee YB |
| 2 |
Korean Journal of Chemical Engineering, 16 (1), pp.96-103 (1999) REMOVAL OF SURFACE CONTAMINANTS BY CRYOGENIC AEROSOL JETS Yoon CN, Kim H, Kim SG, et al. |
