Korean J. Chem. Eng.
Print:
ISSN 0256-1115
Online:
ISSN 1975-7220
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Issue
Total
2
articles [
키워드
:
LPCVD
]
No.
Article
1
Korean Journal of Chemical Engineering
,
33
(9), pp.2711-2715 (2016)
Effect of oxygen flow rate on the electrical and optical characteristics of dopantless tin oxide films fabricated by low pressure chemical vapor deposition
Kim JH, Lee HM, Kang DW, et al.
2
Korean Journal of Chemical Engineering
,
16
(1), pp.12-21 (1999)
NUMERICAL AMALYSIS OF LPCVD OF SiO
2
FILMS FROM DIETHYLSILANE/OXYGEN
Kim EJ, Kim CJ, Chung KY
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