Issue
Total 109 articles [ 키워드: LED ]
No. Article
91 Korean Journal of Chemical Engineering, 20 (5), pp.956-959 (2003)
Patterning Si by Using Surface Functionalization and Microcontact Printing with a Polymeric Ink
Lee KB, Kim DJ, Yoon KR, et al.
92 Korean Journal of Chemical Engineering, 20 (4), pp.755-761 (2003)
Industrial Application of an Extended Fully Thermally Coupled Distillation Column to BTX Separation in a Naphtha Reforming Plant
Kim YH, Choi DW, Hwang KS
93 Korean Journal of Chemical Engineering, 20 (3), pp.566-571 (2003)
Low Cost Growth Route for Single-walled Carbon Nanotubes from Decomposition of Acetylene over Magnesia Supported Fe-Mo Catalyst
Shajahan M, Mo YH, Nahm KS
94 Korean Journal of Chemical Engineering, 20 (1), pp.44-47 (2003)
Experimental and Theoretical Investigation of Boric Acid Production through Reactive Dissolution of Oxalic Acid Crystals in Borax Aqueous Solution
ZareNezhad B
95 Korean Journal of Chemical Engineering, 19 (5), pp.797-802 (2002)
Use of Cascade Reduction Potential for Selective Precipitation of Au, Cu, and Pb in Hydrochloric Acid Solution
Park JS, Moon SH
96 Korean Journal of Chemical Engineering, 19 (4), pp.567-573 (2002)
Scanning Tunneling Microscopy (STM) and Tunneling Spectroscopy (TS) of Heteropolyacid (HPA) Self-Assembled Monolayers (SAMS): Connecting Nano Properties to Bulk Properties
Song IK, Barteau MA
97 Korean Journal of Chemical Engineering, 19 (4), pp.722-727 (2002)
Characterization of Parylene Deposition Process for the Passivation of Organic Light Emitting Diodes
Lee T, Lee J, Park C
98 Korean Journal of Chemical Engineering, 19 (3), pp.383-390 (2002)
Approximate Design of Fully Thermally Coupled Distillation Columns
Kim YH, Nakaiwa M, Hwang KS
99 Korean Journal of Chemical Engineering, 19 (3), pp.463-466 (2002)
White Light Emission Obtained by Direct Color Mixing in Multi-Layer Organic Light-Emitting Devices
Lee SS, Cho SM
100 Korean Journal of Chemical Engineering, 19 (3), pp.524-528 (2002)
Inductively Coupled Plasma Etching of Pb(ZrxTi1- x)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas
Chung CW, Byun YH, Kim HI
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