Issue
Total 2 articles [ 키워드: High Density Plasma Etching ]
No. Article
1 Korean Journal of Chemical Engineering, 20 (6), pp.1138-1141 (2003)
Nanometer-Sized Patterning of Polysilicon Thin Films by High Density Plasma Etching Using Cl2 and HBr Gases
Song YS, Chung CW
2 Korean Journal of Chemical Engineering, 19 (3), pp.524-528 (2002)
Inductively Coupled Plasma Etching of Pb(ZrxTi1- x)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas
Chung CW, Byun YH, Kim HI