Korean J. Chem. Eng.
Print:
ISSN 0256-1115
Online:
ISSN 1975-7220
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Issue
Total
2
articles [
키워드
:
High Density Plasma Etching
]
No.
Article
1
Korean Journal of Chemical Engineering
,
20
(6), pp.1138-1141 (2003)
Nanometer-Sized Patterning of Polysilicon Thin Films by High Density Plasma Etching Using Cl
2
and HBr Gases
Song YS, Chung CW
2
Korean Journal of Chemical Engineering
,
19
(3), pp.524-528 (2002)
Inductively Coupled Plasma Etching of Pb(ZrxTi1- x)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas
Chung CW, Byun YH, Kim HI
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