| Issue |
| Total 4 articles [ 키워드: Fluorocarbon ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 37 (2), pp.374-379 (2020) Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas Kim JH, Kim CK |
| 2 |
Korean Journal of Chemical Engineering, 20 (6), pp.1131-1133 (2003) Thickness of a Modified Surface Layer Formed in a Silsesquioxane-based Low-k Material During Etching in a Fluorocarbon Plasma Hwang SW, Lee GR, Min JH, et al. |
| 3 |
Korean Journal of Chemical Engineering, 17 (6), pp.678-683 (2000) Permeation of Single and Mixed Gases through Composite Membranes Prepared by Plasma Polymerization of Fluorocarbon Compounds Sohn WI, Koo JK, Oh SJ |
| 4 |
Korean Journal of Chemical Engineering, 14 (5), pp.359-364 (1997) High Pressure Vapor-Liquid Equilibria for the HFC125-HFC152a System Nishiumi H, Akita H, Akiyama S |
