| Issue |
| Total 25 articles [ 키워드: Etching ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 39 (1), pp.63-68 (2022) Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether You SH, Kim JH, Kim CK |
| 2 |
Korean Journal of Chemical Engineering, 37 (2), pp.374-379 (2020) Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas Kim JH, Kim CK |
| 3 |
Korean Journal of Chemical Engineering, 35 (6), pp.1348-1353 (2018) Damage to amorphous indium-gallium-zinc-oxide thin film transistors under Cl2 and BCl3 plasma Choi JH, Kim SJ, Kim HT, et al. |
| 4 |
Korean Journal of Chemical Engineering, 31 (12), pp.2274-2279 (2014) Etch characteristics of CoFeB thin films and magnetic tunnel junction stacks in a H2O/CH3OH plasma Hwang SM, Garay A, Lee IH, et al. |
| 5 |
Korean Journal of Chemical Engineering, 31 (1), pp.62-67 (2014) Fabrication and characterization of silicon nanostructures based on metal-assisted chemical etching Zhang W, Fan X, Sang S, et al. |
| 6 |
Korean Journal of Chemical Engineering, 30 (11), pp.2026-2029 (2013) Effects of dye etching on the morphology and performance of ZnO nanorod dye-sensitized solar cells Yang J, Lin Y, Meng Y |
| 7 |
Korean Journal of Chemical Engineering, 29 (6), pp.731-736 (2012) Structural and photoelectrochemical characterization of TiO2 nanowire/nanotube electrodes by electrochemical etching Ya J, An L, Liu Z, et al. |
| 8 |
Korean Journal of Chemical Engineering, 26 (6), pp.1519-1527 (2009) Optimal design of multi-nozzle etching process for shadow mask Seo M, Park JS, Park S, et al. |
| 9 |
Korean Journal of Chemical Engineering, 25 (3), pp.593-598 (2008) Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study Ansari SG, Dar MA, Kim YS, et al. |
| 10 |
Korean Journal of Chemical Engineering, 25 (2), pp.386-389 (2008) Highly selective modification of silicon oxide structures fabricated by an AFM anodic oxidation Choi I, Yi J |
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