| Issue |
| Total 3 articles [ 키워드: Carbon Film ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 37 (2), pp.374-379 (2020) Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas Kim JH, Kim CK |
| 2 |
Korean Journal of Chemical Engineering, 26 (4), pp.1034-1039 (2009) Electrochemical characteristics of amophous carbon coated silicon electrodes Vovk OM, Na BK, Cho BW, et al. |
| 3 |
Korean Journal of Chemical Engineering, 22 (4), pp.639-642 (2005) Structural Properties of Amorphous Carbon Thin Films Deposited by LF (100 kHz), RF (13.56MHz), and Pulsed RF (13.56MHz) Plasma CVD Kim DS |
