| Issue |
| Total 2 articles [ 저자: Ji SH ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 35 (12), pp.2474-2479 (2018) Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma Ji SH, Jang WS, Son JW, et al. |
| 2 |
Korean Journal of Chemical Engineering, 26 (6), pp.1453-1460 (2009) Combined run-to-run and LQG control of a 12-inch RTP equipment Won W, Yun W, Ji SH, et al. |
