| Issue |
| Total 4 articles [ 저자: Chung CW ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 31 (12), pp.2274-2279 (2014) Etch characteristics of CoFeB thin films and magnetic tunnel junction stacks in a H2O/CH3OH plasma Hwang SM, Garay A, Lee IH, et al. |
| 2 |
Korean Journal of Chemical Engineering, 20 (6), pp.1138-1141 (2003) Nanometer-Sized Patterning of Polysilicon Thin Films by High Density Plasma Etching Using Cl2 and HBr Gases Song YS, Chung CW |
| 3 |
Korean Journal of Chemical Engineering, 19 (3), pp.524-528 (2002) Inductively Coupled Plasma Etching of Pb(ZrxTi1- x)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas Chung CW, Byun YH, Kim HI |
| 4 |
Korean Journal of Chemical Engineering, 14 (2), pp.136-140 (1997) METALORGANIC CHEMICAL VAPOR DEPOSITION OF FERROELECTRIC Pb(ZrXTi1-X)O3 THIN FILMS Chung CW, Kim D |
