Issue
Total 30 articles [ 저자: Chae H ]
No. Article
1 Korean Journal of Chemical Engineering, 38 (6), pp.1087-1103 (2021)
A review on the recent developments of ruthenium and nickel catalysts for COx-free H2 generation by ammonia decomposition
Le TA, Do QC, Kim YM, et al.
2 Korean Journal of Chemical Engineering, 37 (12), pp.2317-2325 (2020)
Thermally stable amine-functionalized silica sorbents using one-pot synthesis method for CO2 capture at low temperature
Jo SB, Chae HJ, Kim TY, et al.
3 Korean Journal of Chemical Engineering, 35 (7), pp.1433-1440 (2018)
Comparative study of CHA- and AEI-type zeolytic catalysts for the conversion of chloromethane into light olefins
Shin YH, Kweon SJ, Park MB, et al.
4 Korean Journal of Chemical Engineering, 33 (11), pp.3207-3215 (2016)
Regenerable potassium-based alumina sorbents prepared by CO2 thermal treatment for post-combustion carbon dioxide capture
Jo SB, Lee SC, Chae HJ, et al.
5 Korean Journal of Chemical Engineering, 33 (6), pp.1971-1976 (2016)
Extremely flexible organic-inorganic moisture barriers
Lim SH, Seo SW, Lee H, et al.
6 Korean Journal of Chemical Engineering, 33 (3), pp.1070-1074 (2016)
Enhanced moisture-barrier property and flexibility of zirconium oxide/polymer hybrid structures
Lim SH, Seo SW, Jung E, et al.
7 Korean Journal of Chemical Engineering, 31 (3), pp.528-531 (2014)
Plasma-polymerized n-hexane and its utilization as multilayer moisture-barrier film with aluminum oxide
Hwang KH, Seo SW, Jung E, et al.
8 Korean Journal of Chemical Engineering, 30 (3), pp.509-517 (2013)
Selective oxidation of refractory sulfur compounds for the production of low sulfur transportation fuel
Jeong KE, Kim TW, Kim JW, et al.
9 Korean Journal of Chemical Engineering, 29 (9), pp.1259-1265 (2012)
Electroless deposition of NiMoP films using alkali-free chemicals for capping layers of copper interconnections
Lee HM, Chae H, Kim CK
10 Korean Journal of Chemical Engineering, 29 (4), pp.525-528 (2012)
Low-temperature growth of highly conductive and transparent aluminum-doped ZnO film by ultrasonic-mist deposition
Seo SW, Won SH, Chae H, et al.
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