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HWAHAK KONGHAK,
Vol.35, No.3, 440-444, 1997
Vol.35, No.3, 440-444, 1997
과산화수소가 옥살산의 광분해에 미치는 영향
Effect of H2O2 in Photodestruction of Oxalic Acid
질산이 첨가되었을 경우와 첨가되지 않았을 때의 과산화수소와 옥살산 혼합물의 광분해 연구와 아울러 과산화수소 단독의 광분해 연구가 수행되었다. UV 조사시 과산화수소 분해반응은 과산화수소가 고농도일 경우에는 1차 반응, 저농도에서는 0차 반응으로 나타났다. 옥살산 자체는 UV 조사에 의해서 분해되지 않지만, 과산화수소가 존재할 때 UV 조사에 의해 급격히 분해되었다. 그러나 질산 매질에서 과산화수소는 더 이상 옥살산 분해에 영향을 미치지 않았다. 이것은 과산화수소의 광분해에 의해 발생되는 수산화 라디칼이 옥살산과의 반응으로는 소모되지 못하고, NO3-의 광분해 생성물인 NO2-과의 반응으로 소모됨을 알 수 있었다.
Photodestruction of hydrogen peroxide alone as mixture of hydrogen peroxide and oxalic acid with and without nitric acid were carried out in this study. Decomposition reaction of H2O2 under UV radiation showed that rate equation was first order with respect to [H2O2] for high concentration of H2O2 and zero order for low concentration of H2O2. Oxalic acid itself was not decomposed by UV radiation, whereas in the presence of H2O2 decomposed rapidly under UV radiation. But, the presence of H2O2 in the nitric acid media affected no longer on decomposition of oxalic acid. This was attributed that OH radical generated by photolysis of H2O2 was not consumed by reaction with oxalic acid, but by reaction with NO2- ion to be photolysis product of NO3-.
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참고문헌정보(참고문헌, 인용문헌)는 화학공학소재연구정보센터에 의해 제공되고 있습니다.