Print: | ISSN 0304-128X |
Online: | ISSN 2233-9558 |
HWAHAK KONGHAK,
Vol.34, No.3, 300-304, 1996 FTIR을 이용한 Cu/SiO2 촉매상에서의 메타올 분해반응 연구
FTIR Studies of Methanol Decomposition on Cu/SiO2
Cu/SiO2 촉매에서의 메탄올 분해반응을 연구하기 위하여 FTIR실험을 행하였다. 촉매 표면에 존재하는 메탄올 분해반응 중간물질로는 메탄올,methoxy, formaldehyde, methylenebis(oxy) 및 formate 그룹이 IR 실험결과 나타났으며, 구리의 표면상태가 이들 표면중간물질의 특성에 영향을 주었다. 환원된 촉매의 경우 methoxy가 매우 불안정하고 bidentate formate가 존재한 반면, 부분산화된 촉매의 경우 methoxy의 생성이 두드러졌고 unidentate formate가 존재하였다. 상온에서부터 300℃까지의 승온 FTIR스펙트럼 결과로부터 Cu/SiO2 촉매상에서의 메탄올 분해반응 메카니즘을 제시하였다.
Methanol decomposition on Cu/SiO2 has been investigated by means of Fourier transform infrared spectroscopy. Infrared spectroscopy experiments showed the following surface methanol decomposition intermediates on Cu/SiO2 : methanol, methoxy,formaldehyde, methylenebis(oxy), and formate groups. The characteristics of surface intermediates were affected by the oxidation state of copper. On reduced copper methoxy was highly unstable and bidentate formate was formed, while on oxidized copper methoxy was stable and unidentate formate was formed. A mechanism of methanol decomposition was also proposed based on temperature programmed infrared experiment from 20 to 300℃.
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