Korean Chem. Eng. Res.
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ISSN 0304-128X
Online:
ISSN 2233-9558
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Search / Korean Journal of Chemical Engineering
Total
2
articles [
키워드
:
Plasma Etching
]
No.
Article
1
Korean Chemical Engineering Research
,
44
(5), pp.498-504 (2006)
고밀도 CHF3 플라즈마에서 바이어스 전압과 이온의 입사각이 Photoresist의 식각에 미치는 영향
Effects of Bias Voltage and Ion-incident Angle on the Etching of Photoresist in a High-density CHF3 Plasma
강세구, 민재호, 이진관, et al.
2
HWAHAK KONGHAK
,
40
(5), pp.592-595 (2002)
대기압하에서 비평형 플라스마 생성과 산화아연(ZnO)박막의 식각에의 응용
Generation of Non-Equilibrium Plasma Under Atmospheric Pressure and Its Application to Etching Processes of Zinc Oxide Films
이봉주
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