Korean Chem. Eng. Res.
Print:
ISSN 0304-128X
Online:
ISSN 2233-9558
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Search / Korean Journal of Chemical Engineering
Total
1
articles [
키워드
:
Microwave Power
]
No.
Article
1
HWAHAK KONGHAK
,
35
(3), pp.374-379 (1997)
ECR플라즈마를 이용한 화학증착법에 의해 제조된 실리콘 산화막의 특성
Characteristics of Silicon Oxide Films Prepared by Chemical Vapor Deposition Using ECR Plasma Source
전법주, 오인환, 임태훈, et al.
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