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Search / Korean Journal of Chemical Engineering
Total 1 articles [ 키워드: Ion-incident Angle ]
No. Article
1 Korean Chemical Engineering Research, 44 (5), pp.498-504 (2006)
고밀도 CHF3 플라즈마에서 바이어스 전압과 이온의 입사각이 Photoresist의 식각에 미치는 영향
Effects of Bias Voltage and Ion-incident Angle on the Etching of Photoresist in a High-density CHF3 Plasma
강세구, 민재호, 이진관, et al.