Korean Chem. Eng. Res.
Print:
ISSN 0304-128X
Online:
ISSN 2233-9558
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Search / Korean Journal of Chemical Engineering
Total
1
articles [
키워드
:
Inductively-Coupled Plasma
]
No.
Article
1
HWAHAK KONGHAK
,
39
(1), pp.77-84 (2001)
층간 절연막으로 응용하기 위한 저 유전체 불화탄소 플라즈마 고분자/SiO
2
복합박막의 증착
Deposition of Low-Dielectric Fluorocarbon Plasma Polymer/SiO2 Composite Thin Film for Inter-layer Dielectric(ILD) Application
김동선, 강나경
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